RF-CF 4 plasma surface modification of paper: Chemical evaluation of two sidedness with XPS/ATR-FTIR
Applied Surface Science, cilt.253, sa.9, ss.4367-4373, 2007 (SCI-Expanded, Scopus)
- Yayın Türü: Makale / Tam Makale
- Cilt numarası: 253 Sayı: 9
- Basım Tarihi: 2007
- Doi Numarası: 10.1016/j.apsusc.2006.09.052
- Dergi Adı: Applied Surface Science
- Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Sayfa Sayıları: ss.4367-4373
- Anahtar Kelimeler: Etching, Film deposition, Paper, Plasma, Plasma surface interaction, Two sidedness
- Isparta Uygulamalı Bilimler Üniversitesi Adresli: Hayır
Özet
The study was performed to examine the correlation between the initial roughness and surface fluorination of paper under RF-CF 4 plasma environment. Based on the experimental observations, a correlation was observed between surface fluorination and plasma parameters, e.g. RF-power, treatment time and gas pressure. The level of fluorination with RF-CF 4 plasma treatment was found to be extensive in both side of paper. Even very short treatment time, as low as 1 min at 300 W power, provides effective implantation of fluorine (38.7%) on surfaces. It was observed that, CF 4 plasma treatment had a significant effect on the molecular fragmentation on both side of paper. However, the felt side have a much stronger effect on plasma-induced dissociation and fluorination than in the wire side of paper. © 2006 Elsevier B.V. All rights reserved.