Radio frequency-H2O plasma treatment on indium tin oxide films produced by electron beam and radio frequency magnetron sputtering methods
Thin Solid Films, vol.567, pp.32-37, 2014 (SCI-Expanded, Scopus)
- Publication Type: Article / Article
- Volume: 567
- Publication Date: 2014
- Doi Number: 10.1016/j.tsf.2014.07.035
- Journal Name: Thin Solid Films
- Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Page Numbers: pp.32-37
- Keywords: Electron beam, Indium tin oxide, Radio-frequency magnetron sputtering, Water plasma treatment
- Isparta University of Applied Sciences Affiliated: No
Abstract
Electron beam and radio frequency (RF: 13.56 MHz) magnetron sputtering methods were used to obtain a highly transparent and conductive indium tin oxide (ITO) films. The coated thin films were treated by RF-H2O plasma in order to improve optical and electrical properties. RF-H2O plasma characteristics were investigated by optical emission spectroscopy during surface treatments. X-ray photoelectron spectroscopy results on O 1s core levels indicated the activated oxygen species in both amorphous and crystalline ITO structures. The structural, electrical and optical properties of ITO film were characterized by scanning electron microscopy, X-ray diffraction, and four-probe techniques. After the RF-H2O plasma treatment, the ITO films exhibited lower resistivity and better transparency due to the formation of radical species. © 2014 Elsevier B.V.