Surface sulfonation of paper in so2+O2 plasmas - Hypotheses on reaction mechanisms

ŞAHİN H. T., Young R. A.

Science and Engineering of Composite Materials, vol.15, no.1, pp.79-86, 2008 (SCI-Expanded, Scopus) identifier

  • Publication Type: Article / Article
  • Volume: 15 Issue: 1
  • Publication Date: 2008
  • Journal Name: Science and Engineering of Composite Materials
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.79-86
  • Keywords: Paper, RF-SO2/O2 plasma, Surface properties, XPS
  • Isparta University of Applied Sciences Affiliated: No

Abstract

A new approach to deposit sulfur groups on paper has been evaluated in this study by radio-frequency (RF) SO2H-O2 plasma treatment. The survey and high-energy resolution XPS spectra provide clues to the site of modification on the paper surface. Relatively large variations in the deposited film-like layer composition can be realized by changing plasma parameters. In general, increasing RF-power provides effective implantation of sulfur, from 3.6% to 7.2%. It is clearly shown that elemental oxygen incorporation on paper directly depends on the relative ratio of SO2/O2. All XPS HR C1s diagrams from SO2 + O2 plasma treated samples show a penta model pattern. The presence of CH2-S at 285.7 eV, O = C-O at 289.2 eV, and O-CO-O at 290.4 eV are the new groups characterized. © Freund Publishing House Ltd.